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Hafnium dioxide is used in a wide range of fields, including the following aspects:
1. Microelectronics field:
• Gate insulation material:Because hafnium dioxide has the characteristics of high dielectric constant and wide band gap, it can replace the gate insulation layer silicon dioxide (SIO2) of metal oxide semiconductor field effect tubes (MOSFET) in traditional silicon-based integrated circuits, and increase the capacitance value without increasing the capacitance leakage.Helps to solve the size limit of the development of traditional SiO₂/Si structures in current MOSFETs, can improve the performance and stability of electronic devices, and can further reduce the material size.
2. Optical field:
• Optical film: can be used to make UV anti-reflection film, interference film and other optical films.These films can improve the transmittance, reflectivity and other properties of optical components, and have important applications in optical instruments, laser technology, optical communication and other fields.
• Optical glass: Hafnium dioxide can be added to the preparation of optical glass as an additive to improve the optical properties of the glass, such as refractive index, dispersion, etc., so as to meet the special requirements of different optical systems for glass materials.
3. Refractory field: Hafnium dioxide has the characteristics of high melting point and high temperature resistance, and can be used as a refractory material in high temperature furnaces, aerospace and other fields that require high temperature resistance of materials.
4. Anti-radioactivity field: It can be used as anti-radioactivity coating, which can effectively block the radiation of radioactive substances in some places or equipment requiring radioactive protection, such as nuclear reactors, radioactive laboratories, etc.
5. Catalyst field: It can be used as a catalyst or catalyst carrier to participate in some chemical reactions, although its specific catalytic mechanism and application scenarios are still under continuous research and exploration, but it has shown certain catalytic activity in some specific chemical reactions.
6. Medical field: It has certain application potential in medical field.For example, the research team of Sun Yat-sen University found that hafnium dioxide nanomaterials have organ-targeting selectivity and catalytic activity of a variety of bionic enzymes, which can effectively remove reactive oxygen species (ROS) generated during radiotherapy and protect normal tissues from inflammatory damage caused by radiation, which provides a new design idea for radiotherapy protection.
7. Analytical detection field: can be used for spectral analysis.In spectral analysis technology, as an auxiliary material or standard material, used to calibrate instruments, analyze sample composition, etc.
Hafnium dioxide is used in a wide range of fields, including the following aspects:
1. Microelectronics field:
• Gate insulation material:Because hafnium dioxide has the characteristics of high dielectric constant and wide band gap, it can replace the gate insulation layer silicon dioxide (SIO2) of metal oxide semiconductor field effect tubes (MOSFET) in traditional silicon-based integrated circuits, and increase the capacitance value without increasing the capacitance leakage.Helps to solve the size limit of the development of traditional SiO₂/Si structures in current MOSFETs, can improve the performance and stability of electronic devices, and can further reduce the material size.
2. Optical field:
• Optical film: can be used to make UV anti-reflection film, interference film and other optical films.These films can improve the transmittance, reflectivity and other properties of optical components, and have important applications in optical instruments, laser technology, optical communication and other fields.
• Optical glass: Hafnium dioxide can be added to the preparation of optical glass as an additive to improve the optical properties of the glass, such as refractive index, dispersion, etc., so as to meet the special requirements of different optical systems for glass materials.
3. Refractory field: Hafnium dioxide has the characteristics of high melting point and high temperature resistance, and can be used as a refractory material in high temperature furnaces, aerospace and other fields that require high temperature resistance of materials.
4. Anti-radioactivity field: It can be used as anti-radioactivity coating, which can effectively block the radiation of radioactive substances in some places or equipment requiring radioactive protection, such as nuclear reactors, radioactive laboratories, etc.
5. Catalyst field: It can be used as a catalyst or catalyst carrier to participate in some chemical reactions, although its specific catalytic mechanism and application scenarios are still under continuous research and exploration, but it has shown certain catalytic activity in some specific chemical reactions.
6. Medical field: It has certain application potential in medical field.For example, the research team of Sun Yat-sen University found that hafnium dioxide nanomaterials have organ-targeting selectivity and catalytic activity of a variety of bionic enzymes, which can effectively remove reactive oxygen species (ROS) generated during radiotherapy and protect normal tissues from inflammatory damage caused by radiation, which provides a new design idea for radiotherapy protection.
7. Analytical detection field: can be used for spectral analysis.In spectral analysis technology, as an auxiliary material or standard material, used to calibrate instruments, analyze sample composition, etc.
